Yoshio nishi biography sample

Personal bio
He received a BS degree in materials science and a PhD in electronics engineering from Waseda University and the University of Tokyo, respectively.

Yoshio nishi biography sample pdf

In 1962, he joined Toshiba R&D working mainly on Si based CMOS devices and technology until the mid 80â??s, including developments of the world first 1MCMOS DRAM, 16 bit SOS processor technology, MNOS nonvolatile memory.

His early discovery of electron spin resonance Center, PB,from silicon-silicon dioxide has been recognized as the origin of the fast interface states. In 1986 he joined Hewlett-Packard as the director of the Silicon Process Lab, and led CMOS R&D for HP-PARISC processors, followed by the founding director of HP ULSI Research Laboratory.

In 1995 he joined Texas Instruments Inc, as Senior Vice President and Director of R&D in which he established new R&D model and Kilby Center for TIâ??s IC technology R&D. In 2002 he switched from industry to academia as a faculty member of Stan